sam en moos schreef:
ASM International N.V. Features High-k Metal Gate Technology at Luncheon Seminar
Almere, the Netherlands, December 6, 2010 --- ASM International N.V. (Nasdaq: ASMI and Euronext Amsterdam: ASM) today announced that it will be hosting a technical luncheon seminar in San Francisco, CA, USA, on Wednesday, December 8, 2010, the last day of the International Electron Devices Meeting (IEDM). The seminar will address innovations that enable high-k and metal gates in high volume manufacturing, including advanced Atomic Layer Deposition (ALD) and Epitaxy process technologies.
The agenda is as follows:
Part 1: 11:30 - 12:15 -- Lunch Buffet.
Part 2: 12:15 - 13:00 -- Presentations:
· Mike Chudzik (IBM) on "High-k/Metal Gate Technology for CMOS Scaling from Today to Beyond 14nm
· Shawn Thomas (ASM) on "The Increasing Role of Epitaxy in Future CMOS
Following the presentations, there will be an open dialogue around the presentation topics.
The ASM seminar will take place in the Golden Gate Room at the Hotel Nikko San Francisco, 222 Mason Street, San Francisco, CA, USA, a few minute walk from the Hilton San Francisco. The room will open at 11:30 for invited attendees. Interested parties should contact Rosanne de Vries, + 31 88 100 8569, Rosanne.de.vries@asm.com.